Van der Pauw Method
The Van-der Pauw technique is employed to determine the resistivity and Hall coefficient of a material. It can accurately measure the sample properties having any shape if the sample is 2-dimensional. It uses a four-point probe position around the perimeter of the sample rather than in a straight line. Therefore the average resistivity of the sample measured by this method while the linear arrangement measures the resistivity only in the measuring direction.
Following properties of a material can be measured by this method -
- Resistivity
- Doping type (whether it is p-type or n-type)
- The density of majority carrier
- Mobility of the majority carrier
The following conditions must be met in order to apply this method -
- The sample must be flat shaped and uniformly thick
- The sample should not possess isolated holes
- The sample should be isotropic and homogeneous
- The contacts should be placed at sample edges
- The contact area of individual contacts must be smaller
Van-der Pauw method to determine the resistivity of a uniform sample - 
This technique was invented by Van-der Pauw and is extensively employed in the semiconductor industry for the determination of resistivity of uniform samples. This technique requires an arbitrarily shaped thin-plate sample having four very small ohmic contacts placed on the periphery, usually at the corners of the plate.
In order to determine the resistivity of a uniform sample, the sheet resistance needs to be determined. As demonstrated by Van-der Pauw, two characteristics resistances
needs to be determined. As demonstrated by Van-der Pauw, two characteristics resistances are associated with the corresponding terminals as depicted in Fig. A.
are associated with the corresponding terminals as depicted in Fig. A.
 needs to be determined. As demonstrated by Van-der Pauw, two characteristics resistances
needs to be determined. As demonstrated by Van-der Pauw, two characteristics resistances are associated with the corresponding terminals as depicted in Fig. A.
are associated with the corresponding terminals as depicted in Fig. A.These characteristic resistances and
and are related to the sheet resistance
are related to the sheet resistance through the Van der Pauw equation, as -
through the Van der Pauw equation, as -
 and
and are related to the sheet resistance
are related to the sheet resistance through the Van der Pauw equation, as -
through the Van der Pauw equation, as -For determining and
and , dc current (I) is applied across contact 1 and contact 2 and the voltage
, dc current (I) is applied across contact 1 and contact 2 and the voltage is measured across contact 4 and contact 3, as depicted in Fig. A.
is measured across contact 4 and contact 3, as depicted in Fig. A. 
 and
and , dc current (I) is applied across contact 1 and contact 2 and the voltage
, dc current (I) is applied across contact 1 and contact 2 and the voltage is measured across contact 4 and contact 3, as depicted in Fig. A.
is measured across contact 4 and contact 3, as depicted in Fig. A. Similarly, voltage is measured across contact 1 and contact 4 by applying current I across contacts 2 and contact 3.
is measured across contact 1 and contact 4 by applying current I across contacts 2 and contact 3. and
 and  can be obtained as follows -
 can be obtained as follows - 
 is measured across contact 1 and contact 4 by applying current I across contacts 2 and contact 3.
is measured across contact 1 and contact 4 by applying current I across contacts 2 and contact 3. and
 and  can be obtained as follows -
 can be obtained as follows - For Hot-Point Probe Method - Click Here 
For Four Point Probe Method - Click Here
 







 
 
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